Trifluorosilane Explained
Trifluorosilane is the chemical compound with the formula F3HSi. At standard temperature and pressure, trifluorosilane is a colorless gas.[1] Note that the free radical F3Si is often also referred to as trifluorosilane, although more properly referred to as trifluorosilyl.
Preparation
Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF3 and HSiCl3.[2] HSiCl3 is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 °C.
Formation has also been reported in certain etching operations of silicon.[3]
Properties
The electric dipole moment of trifluorosilane is 1.26 debye.[4] The length of the silicon to fluorine bond is 1.555 Å, Si-H length is 1.55 Å, and ∠FSiF is 110°.[5]
Further reading
- Demaison . J. . Margulès . L. . Breidung . J. . Thiel . W. . Bürger . H. . Ab initio anharmonic force field, spectroscopic parameters and equilibrium structure of trifluorosilane . Molecular Physics . 10 November 1999 . 97 . 9 . 1053–1067 . 10.1080/00268979909482906. 1999MolPh..97.1053D .
Notes and References
- Book: Perry
, Dale L.
. CRC Press. 9781439814628. Handbook of Inorganic Compounds, Second Edition. 2011-06-15.
- Book: Zuckerman
, J. J.
. John Wiley & Sons. 9780470145388. Inorganic Reactions and Methods, The Formation of Bonds to Halogens. 2009-09-17.
- 10.1002/ejic.201200674. 1434-1948. 2012. 34. 5714–5721. Lippold. Marcus. Uwe . Böhme . Christoph . Gondek . Martin . Kronstein . Sebastian . Patzig-Klein . Martin . Weser . Edwin . Kroke. Etching Silicon with HF-HNO 3 -H 2 SO 4 /H 2 O Mixtures - Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si-F Surface Groups. European Journal of Inorganic Chemistry. 2014-08-27. December 2012.
- Ghosh . S. N. . Trambarulo . Ralph . Gordy . Walter . Electric Dipole Moments of Several Molecules from the Stark Effect . The Journal of Chemical Physics . February 1953 . 21 . 2 . 308–310 . 10.1063/1.1698877. 1953JChPh..21..308G .
- Sheridan . John . Gordy . Walter . Microwave Spectra and Molecular Constants of Trifluorosilane Derivatives. Si F 3 H, Si F 3 C H 3, Si F 3 Cl, and Si F 3 Br . Physical Review . 1 March 1950 . 77 . 5 . 719 . 10.1103/PhysRev.77.719. 1950PhRv...77..719S .
