Tribromosilane Explained

Tribromosilane is the chemical compound with the formula HBr₃Si.^[1] At high temperatures, it decomposes to produce silicon, and is an alternative to purified trichlorosilane of ultrapure silicon in the semiconductor industry.

The Schumacher Process of silicon deposition uses tribromosilane gas to produce polysilicon, but it has a number of cost and safety advantages over the Siemens Process to make polysilicon.^[2]

It may be prepared by heating crystalline silicon with gaseous hydrogen bromide at high temperature.^[3] It spontaneously combusts when exposed to air.^[4]

Notes and References

1. Web site: PubChem . Tribromosilane . 2022-12-22 . pubchem.ncbi.nlm.nih.gov . en.
2. http://www.peaksunsilicon.com/schumacher-process/ The Schumacher Process
3. Schumb WC, Young RC . A study of the reaction of hydrogen bromide with silicon . Journal of the American Chemical Society . April 1930 . 52 . 4 . 1464–1469 . 10.1021/ja01367a025 .
4. Schumb WC . The Halides and Oxyhalides of Silicon . Chemical Reviews . December 1942 . 31 . 3 . 587–595 . 10.1021/cr60100a004 .