Tetrasilane is a silane with the structure formula SiH3–(SiH2)2–SiH3. It is the silane analog of butane.
Tetrasilane can be prepared by reacting magnesium silicide (Mg2Si) with acids like 20% phosphoric acid in 50–60 °C.
Mg2Si+ 4H+ \longrightarrow SinH2n+2 |
The reaction can produce silanes up to n=15. The reaction of magnesium silicide with 25% hydrochloric acid produces 40% monosilane, 30% disilane, 15% trisilane, 10% tetrasilane and 5% higher silanes. The mixture can be separated by fractional distillation.
In addition, higher silanes can also be obtained by discharges monosilane:
SiH4 → SiH2 + H2 |
SiH2 + SiH4 → H3Si{-SiH | |
3} |
SiH2 + H3Si{-SiH | |
3 |
→ H3Si{-}SiH2{-}SiH3}
SiH2 + H3Si{-SiH | |
2{-}SiH |
3 → H3Si{-}SiH2{-}SiH2{-}SiH3}
Tetrasilane is a colourless, pyrophoric liquid that has a disgusting odour. Even below 54 °C, it will still spontaneous combust. It is even more unstable than trisilane, slowly decomposing at room temperature, releasing hydrogen and forming shorter chain silanes.
Photochemical disproportionation of tetrasilane will produce 3-silylpentasilane and disilane.
2 Si4H10 → Si2H6 +H3Si{-SiH(Si | |
2H |
6)2}
With the presence of aluminium chloride, heating tetrasilane in xylene will allow isomerization to isotetrasilane.[1]
2 H3Si{-SiH | |
2{-}SiH |
2{-}SiH3\longrightarrow H3Si{-}SiH(SiH3)2}