Tammann and Hüttig temperatures explained

The Tammann temperature (also spelled Tamman temperature) and the Hüttig temperature of a given solid material are approximations to the absolute temperatures at which atoms in a bulk crystal lattice (Tammann) or on the surface (Hüttig) of the solid material become sufficiently mobile to diffuse readily, and are consequently more chemically reactive and susceptible to recrystallization, agglomeration or sintering.[1] [2] These temperatures are equal to one-half (Tammann) or one-third (Hüttig) of the absolute temperature of the compound's melting point. The absolute temperatures are usually measured in Kelvin.

Tammann and Hüttig temperatures are important for considerations in catalytic activity, segregation and sintering of solid materials. The Tammann temperature is important for reactive compounds like explosives and fuel oxiders, such as potassium chlorate (TTammann = 42 °C), potassium nitrate (TTammann = 31 °C), and sodium nitrate (NaNO3, TTammann = 17 °C), which may unexpectedly react at much lower temperatures than their melting or decomposition temperatures.[3]

The bulk compounds should be contrasted with nanoparticles which exhibit melting-point depression, meaning that they have significantly lower melting points than the bulk material, and correspondingly lower Tammann and Hüttig temperatures.[4] For instance, 2 nm gold nanoparticles melt at only about 327 °C, in contrast to 1065 °C for a bulk gold.

History

Tammann temperature was pioneered by German astronomer, solid-state chemistry, and physics professor Gustav Tammann in the first half of the 20th century. He had considered a lattice motion very important for the reactivity of matter and quantified his theory by calculating a ratio of the given material temperatures at solid-liquid phases at absolute temperatures. The division of a solid's temperature by a melting point would yield a Tammann temperature. The value is usually measured in Kelvins (K):

TTammann={\beta}{ x }Tmeltingpoint(inK)

[5]

where

{\beta}

is a constant dimensionless number.

The threshold temperature for activation and diffusion of atoms at surfaces was studied by, physical chemist on the faculty of Graz University of Technology, who wrote in 1948 (translated from German):[6] [7]

Description

The Hüttig temperature for a given material is

THüttig=\alpha x Tmp

where

Tmp

is the absolute temperature of the material's bulk melting point (usually specified in Kelvin units) and

\alpha

is a unitless constant that is independent of the material, having the value

\alpha=0.3

according to some sources, or

\alpha=1/3

according to other sources.[8] [9] It is an approximation to the temperature necessary for a metal or metal oxide surfaces to show significant atomic diffusion along the surface, sintering, and surface recrystallization. Desorption of adsorbed gasses and chemical reactivity of the surface often increase markedly as the temperature is increases above the Hüttig temperature.

The Tammann temperature for a given material is

TTammann=\beta x Tmp

where

\beta

is a unitless constant usually taken to be

0.5

, regardless of the material. It is an approximation to the temperature necessary for mobility and diffusion of atoms, ions, and defects within a bulk crystal. Bulk chemical reactivity often increase markedly as the temperature is increased above the Tammann temperature.

Examples

The following table gives an example Tammann and Hüttig temperatures calculated from each compound's melting point Tmp according to:

TTammann = 0.5 × Tmp

THüttig = 0.3 × Tmp

Temperatures for metal and semimetal oxides.[10] [11] !Compound!Ion type!TTammann (K)!TTammann (°C)!THüttig (K)!THüttig (°C)
-61734437097
-668395401128
-877604526253
-678405407134
O2−800527480207
O2−754481452179
Cl1−447174268−5
Cl1−35279211−62
-904631542269
-14421169865592
O2−90463132047
S2−729456437164
-863590518245
O2−1114841668395
Cl2−641368384111
O2−127−14676−197
-1129856677404
-13621089817544
-914641548275
O2−51223930734
-1014741608335
O2−412139247−26
O2−36289217−56
Cl2−427154256−17
Cl2−32249193−80
-34774208−65
O2−1124851674401
-877604438165
O2−1032759516243
O2−858585426156
O2−972699486213

References

  1. Book: Conkling, John A. . Chemistry of pyrotechnics : basic principles and theory . 2019 . Chris Mocella . 978-0-429-26213-5 . 3 . Boca Raton, FL . 1079055294.
  2. Book: Preparation of solid catalysts . 1999 . Wiley-VCH . G. Ertl, H. Knözinger, J. Weitkamp . 978-3-527-61952-8 . Weinheim . 264615500.
  3. Book: Forensic investigation of explosions . 2012 . CRC Press . Alexander Beveridge . 978-1-4665-0394-6 . 2 . Boca Raton . 763161398.
  4. Dai . Yunqian . Lu . Ping . Cao . Zhenming . Campbell . Charles T. . Xia . Younan . 2018 . The physical chemistry and materials science behind sinter-resistant catalysts . Chemical Society Reviews . en . 47 . 12 . 4314–4331 . 10.1039/C7CS00650K . 29745393 . 1539900 . 0306-0012.
  5. Tammann . G. . 1924 . Die Temp. d. Beginns innerer Diffusion in Kristallen . Zeitschrift für anorganische und allgemeine Chemie . de . 157 . 1 . 321. 10.1002/zaac.19261570123 .
  6. Hüttig . G. F. . Theoretical Principles of Sintering in Metal Powders . Archiv für Metallkunde . 1948 . 2 . 93–99 . 10 April 2023.
  7. Book: Michaelson . Herbert B. . The Theories of the Sintering Process: A Guide to the Literature (1931–1951) . 1951 . U.S. Atomic Energy Commission, Technical Information Service . Oak Ridge, Tennessee . 34 . 10 April 2023.
  8. Menon . P. G. . Rao . T. S. R. Prasada . Surface Enrichment in Catalysts . Catalysis Reviews . 20 . 1 . 1979 . 0161-4940 . 10.1080/03602457908065107 . 97–120.
  9. Spencer . M. S. . Stable and metastable metal surfaces in heterogeneous catalysis . Nature . 323 . 6090 . 1986 . 0028-0836 . 10.1038/323685a0 . 685–687. 1986Natur.323..685S . 4350909 .
  10. Argyle . Morris . Bartholomew . Calvin . 2015-02-26 . Heterogeneous Catalyst Deactivation and Regeneration: A Review . Catalysts . en . 5 . 1 . 145–269 . 10.3390/catal5010145 . 2073-4344. free .
  11. Book: Catalysis. Volume 10 : a review of recent literature . 1993 . Royal Society of Chemistry . James J. Spivey, Sanjay K. Agarwal . 978-1-84755-322-5 . Cambridge, England . 237047448.