Hafnium disulfide explained

Hafnium disulfide is an inorganic compound of hafnium and sulfur. It is a layered dichalcogenide with the chemical formula is HfS₂. A few atomic layers of this material can be exfoliated using the standard Scotch Tape technique (see graphene) and used for the fabrication of a field-effect transistor.^[1] High-yield synthesis of HfS₂ has also been demonstrated using liquid phase exfoliation, resulting in the production of stable few-layer HfS₂ flakes.^[2] Hafnium disulfide powder can be produced by reacting hydrogen sulfide and hafnium oxides at 500–1300 °C.^[3]

Notes and References

1. 10.1038/srep22277. Few-layer HfS₂ transistors. Scientific Reports. 6. 22277. 2016. Kanazawa. Toru. Amemiya. Tomohiro. Ishikawa. Atsushi. Upadhyaya. Vikrant. Tsuruta. Kenji. Tanaka. Takuo. Miyamoto. Yasuyuki. 26926098. 4772098. 2016NatSR...622277K.
2. Kaur. Harneet. High Yield Synthesis and Chemical Exfoliation of Two-Dimensional Layered Hafnium Disulphide. Nano Research. 1611.00895. 10.1007/s12274-017-1636-x. 2017. 99414438 .
3. Kaminskii. B. T.. Prokof'eva. G. N.. Plygunov. A. S.. Galitskii. P. A.. 1973-07-01. Manufacture of zirconium and hafnium sulfide powders. Soviet Powder Metallurgy and Metal Ceramics. 12. 7. 521–524. 10.1007/BF00796747. 95277086 .