| David T. Attwood | |
| Workplaces: | UC Berkeley Lawrence Berkeley National Laboratory |
| Alma Mater: | New York University |
| Known For: | X-ray optics EUV lithography |
David Attwood is an American physicist and professor emeritus at the University of California, Berkeley, where he worked in the field of synchrotron radiation[1] and free-electron lasers, developing X-ray microscopy[2] techniques for research and for the industry (EUV lithography[3]). He is the author of a reference book on soft X-rays and extreme ultraviolet radiation.[4]
David Attwood received his Ph.D. in Applied Physics from New York University in 1972.[5] After his Ph.D, he joined Lawrence Livermore National Laboratory to work on laser fusion.[6] He was the first scientific director of the Advanced Light Source (1985–1988) and the founding director of the Center for X-Ray Optics at Lawrence Berkeley National Laboratory, where he pioneered EUV lithography. He co-founded the Applied Science and Technology (AS&T) program within the college of engineering at UC Berkeley and supervised over twenty grad students,[7] among who Regina Soufli and Anne Sakdinawat. He is a Fellow of the American Physical Society.