| Chemical Vapor Deposition | |
| Cover: | Chemical Vapor Deposition (journal) cover.jpg |
| Abbreviation: | Chem. Vap. Depos. |
| Discipline: | Materials science |
| Editor: | Peter Gregory |
| Publisher: | Wiley-VCH |
| History: | 1995–2015 |
| Frequency: | Monthly |
| Impact: | 1.333 |
| Impact-Year: | 2016 |
| Issn: | 0948-1907 |
| Eissn: | 1521-3862 |
| Coden: | CVDEFX |
| Lccn: | sn96038108 |
| Oclc: | 865512213 |
| Website: | http://www.cvd-journal.de |
| Link2: | http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1521-3862/issues |
| Link2-Name: | Online archive |
Chemical Vapor Deposition was a monthly peer-reviewed scientific journal covering materials science. It was established in 1995 and ceased independent publication in 2015, when it became a section of Advanced Materials Interfaces. The journal was published by Wiley-VCH and the editor-in-chief was Peter Gregory.
The journal was abstracted and indexed in:According to the Journal Citation Reports, the journal's final (2016) impact factor was 1.333.[1]